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Proceedings Paper

Generation of wet-chemical AR coatings on plastic substrates by the use of polymerizable nanoparticles
Author(s): Peter William Oliveira; Herbert Krug; A. Frantzen; Martin Mennig; Helmut K. Schmidt
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Paper Abstract

Multi-layer interference filters of surface modified SiO2- and TiO2-nanoparticles have been produced on polycarbonat (PC) and on scratch resistant film. AR-coatings (anti-reflex- coatings) were prepared from a dispersion of SiO2 and TiO2 colloidal nanoparticles in a hybrid inorganic organic matrix. The TiO2 particles have been synthesized by addition of HCl and H2O to a solution of titanium tetraisopropanolate in isopropanol. The SiO2 nanoparticles were synthesized by base catalyzed hydrolyses and condensation of tetraethoxysilane (TEOS) mixed with an aqueous solvent. The surface modification of the TiO2 and SiO2 nanoparticles with 3-glycidoxypropyltrimethoxysilane (GPTS) avoids the agglomeration of the nanoparticles and covalent bonds between the matrix and nanoparticles are formed during a photopolymerization step. The nanoparticles were dispersed in a hydrolyzed GPTS matrix and UVI Cygacure 6974 was added as a photoinitiator. The (lambda) /4 ((lambda) equals 550 nm) films of TiO2 and SiO2 sols were prepared on PC and on scratch resistant coated PC by spin-coating techniques. The refractive index of the SiO2/TiO2-coatings can be adjusted from 1.47 up to 1.94 depending on the SiO2 or TiO2 concentration. By the combination of index matching and photopolymerization, a low temperature interference filter can be realized for plastic substrates with reflection of 0.5% at 550 nm. The coatings show excellent adhesion to the substrates in the cross hatch test and promising mechanical properties.

Paper Details

Date Published: 2 October 1997
PDF: 10 pages
Proc. SPIE 3136, Sol-Gel Optics IV, (2 October 1997); doi: 10.1117/12.284139
Show Author Affiliations
Peter William Oliveira, Institut fuer Neue Materialien (Germany)
Herbert Krug, Institut fuer Neue Materialien (United States)
A. Frantzen, Institut fuer Neue Materialien (Germany)
Martin Mennig, Institut fuer Neue Materialien (Germany)
Helmut K. Schmidt, Institut fuer Neue Materialien (Germany)


Published in SPIE Proceedings Vol. 3136:
Sol-Gel Optics IV
Bruce S. Dunn; John D. Mackenzie; Edward J. A. Pope; Helmut K. Schmidt; Masayuki Yamane, Editor(s)

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