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Proceedings Paper

Thick silicate glass film for a waveguide
Author(s): Masayuki Yamane; Shuichi Shibata; Tetsuji Yano; Kenichi Watanabe
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Paper Abstract

The formation of a borosilicate glass film of 10 - 20 micrometers in thickness on a silicon substrate via an interfacial polymerization technique has been studied as the first step for the preparation of a planer waveguide for optical communication. A gel film prepared from the partially hydrolyzed TMOS mixed with boron alkoxides could be densified into a glass film of 16 micrometer in thickness having a smooth surface by the heat treatment up to 1000 degrees Celsius. A good reproducibility in the yield was obtained by completing the hydrolysis and condensation of the whole ingredient in the 5 ml of precursor solution spread over water containing triethylamine as a catalyst within a cylindrical container of about 80 mm inside diameter. The use of saturated aqueous solution of boric acid instead of distilled water was necessary to hinder the re-dissolution of boron from the formed gel film.

Paper Details

Date Published: 2 October 1997
PDF: 9 pages
Proc. SPIE 3136, Sol-Gel Optics IV, (2 October 1997); doi: 10.1117/12.284118
Show Author Affiliations
Masayuki Yamane, Tokyo Institute of Technology (Japan)
Shuichi Shibata, Tokyo Institute of Technology (Japan)
Tetsuji Yano, Tokyo Institute of Technology (Japan)
Kenichi Watanabe, Tokyo Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 3136:
Sol-Gel Optics IV
Bruce S. Dunn; John D. Mackenzie; Edward J. A. Pope; Helmut K. Schmidt; Masayuki Yamane, Editor(s)

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