Share Email Print
cover

Proceedings Paper

Unified thermal/elastic optical analysis of a lithographic lens
Author(s): Alson E. Hatheway
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Lithographic lenses often exhibit shifts in focal position and magnification due to the influence of the heating transient initiated when the illuminator is turned on. Evaluation of these effects requires simultaneous solution of the equations of heat transfer, elasticity and optical images. "Unified” analysis techniques were used, including the Optical Analogtm, which provide accurate analysis of the influence of all the design variables on the optical image. This paper describes the modeling process in detail as well as the checkout techniques used to assure that the physics of the problem had been adequately captured in the model. The paper closes with a discussion of some of the valuable insights that were gained during the analysis.

Paper Details

Date Published: 25 September 1997
PDF: 9 pages
Proc. SPIE 3130, Lens Design, Illumination, and Optomechanical Modeling, (25 September 1997); doi: 10.1117/12.284051
Show Author Affiliations
Alson E. Hatheway, Alson E. Hatheway Inc. (United States)


Published in SPIE Proceedings Vol. 3130:
Lens Design, Illumination, and Optomechanical Modeling
R. Barry Johnson; Robert E. Fischer; R. Barry Johnson; Richard C. Juergens; Richard C. Juergens; Paul R. Yoder Jr.; Warren J. Smith; Paul R. Yoder Jr., Editor(s)

© SPIE. Terms of Use
Back to Top