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Proceedings Paper

Measuring critical dimensions and overlays as prescribed by the National Technology Roadmap for Semiconductors
Author(s): Syed A. Rizvi
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Paper Abstract

Continued demands on shrinking features with tighter tolerance on critical dimensions (CDs) and overlays (OL) are placing stringent requirements on parameters that are essentially the building blocks of the metrologies for CDs and overlays. This paper conducts a reality check on the precision and error budgets assigned to CD and overlay controls by the National Technology Roadmap for Semiconductors (NTRS) in light of constraints on parameters that are fundamental to the above measurements.

Paper Details

Date Published: 12 February 1997
PDF: 6 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.284025
Show Author Affiliations
Syed A. Rizvi, Photronics, Inc. (United States)


Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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