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Proceedings Paper

X-ray micromachining of deep 3D terahertz waveguide components using a laser plasma source at 1-nm wavelength
Author(s): I. C. Edmond Turcu; Chris M. Mann; Sung W. Moon; B. J. Maddison; Ric M. Allott; Nicola Lisi; Syed Ejazu Huq; Nam Seong Kim
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Paper Abstract

Fabrication of 3D terahertz waveguide components is demonstrated using a novel x-ray micromachining process with integral and embedded x-ray masks. 1 nm x-rays generated by a laser-plasma source are used to expose chemically amplified resist. A repeated exposure and development technique shortens the total x-ray exposure time to 10 min to obtain the required 48 micrometers high structures. A 2.5 THz waveguide cavity is fabricated in gold by electroplating the above resist microstructure.

Paper Details

Date Published: 14 October 1997
PDF: 9 pages
Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); doi: 10.1117/12.284000
Show Author Affiliations
I. C. Edmond Turcu, Rutherford Appleton Lab. (United Kingdom)
Chris M. Mann, Rutherford Appleton Lab. (United Kingdom)
Sung W. Moon, Rutherford Appleton Lab. (UK) and Kumho Institute of Science and Technology (South Korea)
B. J. Maddison, Rutherford Appleton Lab. (United Kingdom)
Ric M. Allott, Rutherford Appleton Lab. (United Kingdom)
Nicola Lisi, Rutherford Appleton Lab. (United Kingdom)
Syed Ejazu Huq, Rutherford Appleton Lab. (United Kingdom)
Nam Seong Kim, Rutherford Appleton Lab. (UK) and Kumho Information and Telecommunication Lab. (South Korea)

Published in SPIE Proceedings Vol. 3157:
Applications of X Rays Generated from Lasers and Other Bright Sources
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

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