Share Email Print
cover

Proceedings Paper

Extreme ultraviolet spectroscopy of a laser plasma source for lithography
Author(s): Fred Bijkerk; Alexander P. Shevelko; Leonid A. Shmaenok; S. S. Churilov
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Spectra from various target materials from a KrF-laser plasma source have been investigated in the extreme UV spectral range between 12 and 17 nm using an off-Rowland grazing-incidence spectrograph. Additional calibration of the yield at 13 nm and measurement of the spatial and temporal characteristics of the plasma has been done using a combination of a multilayer mirror and XUV diode or fiber image carrier system.

Paper Details

Date Published: 14 October 1997
PDF: 5 pages
Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); doi: 10.1117/12.283984
Show Author Affiliations
Fred Bijkerk, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Alexander P. Shevelko, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
P.N. Lebedev Physical Institute (Russia)
Leonid A. Shmaenok, FOM Institute for Plasma Physics Rijnhuizen (Netherlands) and A.F. Ioffe Physical-Technica (Russia)
S. S. Churilov, Institute for Spectroscopy (Russia)


Published in SPIE Proceedings Vol. 3157:
Applications of X Rays Generated from Lasers and Other Bright Sources
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

© SPIE. Terms of Use
Back to Top