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Proceedings Paper

Design and efficiency characterization of diffraction gratings for applications in synchrotron monochromators by electromagnetic methods and its comparison with measurement
Author(s): Bernd H. Kleemann; Johannes Gatzke; Christian Jung; Bruno Nelles
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Paper Abstract

For the design and characterization of synchrotron monochromators in the XUV region it is advantageous to know the performance of the mirrors and gratings as exact as possible within the wavelength range of operation to get performance results under realistic conditions. For that reason, monochromator gratings for dipole radiation as well as for undulator radiation at BESSY II are investigated in their wavelength range of operation by two different methods of electromagnetic grating theory. The IESMP, developed at BIFO, is a special boundary integral method, while the other, LUMNAB, developed by M. Nevière and available at BESSY, is based on the differential equation method. Both methods are compared with measurements on a plane grating in fixfocus condition for an energy range from 150 eV to 1000 eV. The observed differences between both methods and between the numerical results and measurement are discussed. For a grating monochromator in a variable included angle scheme efficiencies from the IESMP calculations for the first and higher orders are compared with scalar theory. Because of significant differences in the predictions of both methods this has to be verified by measurement.

Paper Details

Date Published: 3 November 1997
PDF: 11 pages
Proc. SPIE 3150, Gratings and Grating Monochromators for Synchrotron Radiation, (3 November 1997); doi: 10.1117/12.283976
Show Author Affiliations
Bernd H. Kleemann, Berlin Institute of Optics (Germany)
Johannes Gatzke, Max Born Institute for Nonlinear Optics and Short-Pulse Spectroscopy (Germany)
Christian Jung, BESSY GmbH (Germany)
Bruno Nelles, Carl Zeiss (Germany)


Published in SPIE Proceedings Vol. 3150:
Gratings and Grating Monochromators for Synchrotron Radiation
Wayne R. McKinney; Christopher A. Palmer, Editor(s)

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