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Proceedings Paper

Silicon diffraction gratings for use in the far and extreme ultraviolet
Author(s): Robert L. Bristol; Jerald A. Britten; Richelieu Hemphill; Patrick N. Jelinsky; Mark Hurwitz
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Paper Abstract

We report the fabrication and evaluation of silicon diffraction gratings for use in the far- and extreme- ultraviolet. An interference technique was used to expose a layer of photoresist on a 10 cm silicon wafer in a series of parallel strips. V-shaped grooves were then etched into the wafer anisotropically. Diffraction efficiencies for a first pair of gratings at groove periods of 1.0 and 2.5 micrometers were measured. The process leaves much room for refinement, but shows promise in that the gratings produce clear diffraction orders with reasonable efficiency and have groove facets free of pitting or sharp ridges.

Paper Details

Date Published: 15 October 1997
PDF: 6 pages
Proc. SPIE 3114, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy VIII, (15 October 1997); doi: 10.1117/12.283792
Show Author Affiliations
Robert L. Bristol, Univ. of California/Berkeley (United States)
Jerald A. Britten, Lawrence Livermore National Lab. (United States)
Richelieu Hemphill, Univ. of California/Berkeley (United States)
Patrick N. Jelinsky, Univ. of California/Berkeley (United States)
Mark Hurwitz, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3114:
EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy VIII
Oswald H. W. Siegmund; Mark A. Gummin, Editor(s)

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