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Proceedings Paper

Optimization of LPCVD silicon oxynitride growth to large refractive index homogeneity and layer thickness uniformity
Author(s): Kerstin Woerhoff; Paul V. Lambeck; H. Albers; Oscar Noordman; Niko F. van Hulst; Th. J. A. Popma
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Paper Abstract

The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.

Paper Details

Date Published: 24 September 1997
PDF: 12 pages
Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); doi: 10.1117/12.281235
Show Author Affiliations
Kerstin Woerhoff, Univ. of Twente (Netherlands)
Paul V. Lambeck, Univ. of Twente (Netherlands)
H. Albers, Univ. of Twente (Netherlands)
Oscar Noordman, Univ. of Twente (Netherlands)
Niko F. van Hulst, Univ. of Twente (Netherlands)
Th. J. A. Popma, Univ. of Twente (Netherlands)


Published in SPIE Proceedings Vol. 3099:
Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications

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