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Proceedings Paper

Characterization of chirped phase masks for UV applications by writing and investigation of fiber Bragg gratings
Author(s): Manfred Rothhardt; Volker Hagemann; Ruediger Poehlmann; Siegmund Schroeter; Hans-Joerg Fuchs
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Paper Abstract

We describe the characterization of chirped phase masks made by electron beam writing and reactive ion etching in pure silica. The phase masks are designed to be used as diffractive optical elements in the process of manufacturing of fiber Bragg gratings (FBG). With the technologies available at our institutes grating structures with periods less than 200 nm can be realized in fused silica. Phase masks for writing ideally chirped FBG would require grating structures with continuously changing period. However because of the limited position accuracy of any e-beam writer, it is not possible to generate the desired continuous variation of the grating period. There appear discrete displacement steps with deviations of some nanometers. We obtain some information about the parameters of the phase mask from the properties of written fiber gratings. A sequence of short fiber gratings is written in order to characterize the phase mask. We use a slit to expose a definite small part of the phase mask pattern during the writing process of each short fiber grating. The center wavelength of each fiber grating is analyzed.

Paper Details

Date Published: 24 September 1997
PDF: 6 pages
Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); doi: 10.1117/12.281230
Show Author Affiliations
Manfred Rothhardt, Institute for Physical High Technology (Germany)
Volker Hagemann, Institute for Physical High Technology (Germany)
Ruediger Poehlmann, Institute for Physical High Technology (Germany)
Siegmund Schroeter, Institute for Physical High Technology (Germany)
Hans-Joerg Fuchs, Univ. of Jena (Germany)


Published in SPIE Proceedings Vol. 3099:
Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications
Olivier M. Parriaux; Ernst-Bernhard Kley; Brian Culshaw; Magnus Breidne, Editor(s)

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