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Proceedings Paper

Comparison of spatial self-filtering using numerical, photorefractive, and nonphotorefractive techniques
Author(s): Ernst Ulrich Wagemann; Hans J. Tiziani
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Paper Abstract

In periodic structures the Fourier peaks have to be removed in order to enhance defects. This can be done by digital image processing or by optical means. Recently we presented some new developments in microscopic defect enhancement by spatial self-filtering using B12SiO20 (BSO) in the Fourier plane of an optical processor. In this paper we summarize spatial filtering using photorefractive, non- linear devices and equivalent numerical techniques. We sue BSO as photorefractive medium and two different optically addressed spatial light modulators as nonlinear devices.

Paper Details

Date Published: 17 September 1997
PDF: 10 pages
Proc. SPIE 3098, Optical Inspection and Micromeasurements II, (17 September 1997); doi: 10.1117/12.281169
Show Author Affiliations
Ernst Ulrich Wagemann, Univ. Stuttgart (Germany)
Hans J. Tiziani, Univ. Stuttgart (Germany)


Published in SPIE Proceedings Vol. 3098:
Optical Inspection and Micromeasurements II
Christophe Gorecki, Editor(s)

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