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Proceedings Paper

Prototype of an energy enhancer for mask-based laser material processing
Author(s): Jens Bastue; Flemming O. Olsen
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Paper Abstract

In general mask based laser material processing is a process which suffers from a low energy efficiency, because the majority of the laser light is absorbed in or reflected by the mask. We have developed a device called an energy enhancer which is capable of improving the energy efficiency by a factor of 2 - 4 for a typical TEA-CO2 system for mask based laser marking. A simple ray-tracing model has been built in order to design and optimize the energy enhancer. Thus we present experimental results as well as simulations and show fine accordance between the two. Important system parameters like component reflectivity and alignment sensitivity are investigated in order to evaluate the possibility of making commercial use of the device. The obtainable image quality and how this is influenced by the focusing and imaging system is discussed in some detail.

Paper Details

Date Published: 18 August 1997
PDF: 12 pages
Proc. SPIE 3097, Lasers in Material Processing, (18 August 1997); doi: 10.1117/12.281101
Show Author Affiliations
Jens Bastue, Technical Univ. of Denmark (Denmark)
Flemming O. Olsen, Technical Univ. of Denmark (Denmark)


Published in SPIE Proceedings Vol. 3097:
Lasers in Material Processing
Leo H. J. F. Beckmann, Editor(s)

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