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Proceedings Paper

Applications and use of in-situ chemical sensors in semiconductor manufacturing
Author(s): Donald L. Tolliver; George H. Atkinson
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Paper Abstract

The use of in-situ chemical sensors in semiconductor wafer fabrication will increase significantly over the next five years. Advanced gas phase and liquid phase real time, non contaminating chemical sensors will be applied in four major categories of use. These four areas of application are: (1) Upstream measurements of trace contaminants in high purity process gases and liquids. (2) In-the-chamber or in-the- process bath measurements of chemical species of on line active process tools. (3) Real time, on line, downstream measurements of gas phase and liquid phase effluents coming from semiconductor wafer process tools. (4) Semiconductor industrial hygiene and safety monitors for toxic substances in the work place. This paper will review each of these major applications for both gases and liquids as they will need to be integrated into semiconductor wafer manufacturing over time. Some existing sensor applications currently exist. This review will focus extensively on in-situ real time chemical monitoring sensors.

Paper Details

Date Published: 23 July 1997
PDF: 12 pages
Proc. SPIE 3082, Electro-Optical Technology for Remote Chemical Detection and Identification II, (23 July 1997); doi: 10.1117/12.280920
Show Author Affiliations
Donald L. Tolliver, Innovative Lasers Corp. (United States)
George H. Atkinson, Innovative Lasers Corp. (United States)


Published in SPIE Proceedings Vol. 3082:
Electro-Optical Technology for Remote Chemical Detection and Identification II
Mahmoud Fallahi; Ellen A. Howden, Editor(s)

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