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Proceedings Paper

Direct patterning of electrodeposited polythiophene thin films by ultraviolet laser ablation
Author(s): Xiao Hu; Terence Kin Shun Wong; S. Gao; H. M. Liu; Yee Loy Lam; Yuen Chuen Chan; Feng-Lan Xu
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Paper Abstract

In this paper, we report a simple direct-write patterning process for the conjugated polymer polythiophene based on ultraviolet laser ablation. The polythiophene films were prepared by electrochemical polymerization. A custom built dual function lithography system based on a 325nm CW He-Cd laser was used for patterning the films. Ablation was observed for an incident power density of 286kWcm-2. Grooves with widths in the range of 2-3 micrometers have been fabricated. This process does not involve resist masks and any wet development step. The insolubility of polythiophene suggests that it can be used as a positive self-developing resist. Alternatively, the ablated patterns can be sued directly as device structures. The present process may have applications in polymer electronic devices and micromachining.

Paper Details

Date Published: 14 August 1997
PDF: 9 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280552
Show Author Affiliations
Xiao Hu, Nanyang Technological Univ. (Singapore)
Terence Kin Shun Wong, Nanyang Technological Univ. (Singapore)
S. Gao, Nanyang Technological Univ. (Singapore)
H. M. Liu, Nanyang Technological Univ. (Singapore)
Yee Loy Lam, Nanyang Technological Univ. (Singapore)
Yuen Chuen Chan, Nanyang Technological Univ. (Singapore)
Feng-Lan Xu, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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