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Proceedings Paper

Resolution and depth of focus in optical lithography
Author(s): Chris A. Mack
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Paper Abstract

Common uses of the terms 'resolution' and 'depth of focus' (DOF) are explored as they relate to semiconductor lithography. A definition of DOF is given which is most appropriate to photolithography for IC manufacturing. Examples of the use of the definition for DOF for studying trends in lithography are given. Resolution is then defined based on realistic requirements for semiconductor manufacturing. Using this definition of resolution, the common scaling law of resolution with numerical aperture is shown to be inaccurate under typical conditions.

Paper Details

Date Published: 14 August 1997
PDF: 14 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280550
Show Author Affiliations
Chris A. Mack, FINLE Technologies (United States)


Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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