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Proceedings Paper

Preliminary results on x-ray lithography using a compact plasma focus
Author(s): Sing Lee; X. Feng; Guan Zhang; Paul Choon Keat Lee; Mahe Liu; Adrian Serban; Stuart Victor Springham; Terence Kin Shun Wong; K. Wira; C. Selvam; A. Thang
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Paper Abstract

A 1.8kJ compact plasma focus source operated in neon is demonstrated as an x-ray source for microlithography in the wavelength range of 0.8-1.4 nm. Lithographs are obtained by exposing the resist to the x-ray point source with a mask in contact with the resist. The total energy emitted is measured using PIN diodes and photoconducting diamond detectors to be 15J per shot with a spectrum peaked at 1keV corresponding to the K shell lines from the neon working gas. The maximum repetition rate of 20 Hz allows lithographs to be obtained in less than 20 seconds when a reasonably sensitive resist is used.

Paper Details

Date Published: 14 August 1997
PDF: 5 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280532
Show Author Affiliations
Sing Lee, Nanyang Technological Univ. (Singapore)
X. Feng, Nanyang Technological Univ. (Singapore)
Guan Zhang, Nanyang Technological Univ. (Singapore)
Paul Choon Keat Lee, Nanyang Technological Univ. (Singapore)
Mahe Liu, Nanyang Technological Univ. (Singapore)
Adrian Serban, Nanyang Technological Univ. (Singapore)
Stuart Victor Springham, Nanyang Technological Univ. (Singapore)
Terence Kin Shun Wong, Nanyang Technological Univ. (Singapore)
K. Wira, Nanyang Technological Univ. (Singapore)
C. Selvam, Nanyang Technological Univ. (Singapore)
A. Thang, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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