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Proceedings Paper

Compact plasma focus soft x-ray source with high repetition rate and high intensity
Author(s): Sing Lee; Paul Choon Keat Lee; Guan Zhang; X. Feng; Adrian Serban; Mahe Liu; Terence Kin Shun Wong; C. Selvam; A. Thang
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Paper Abstract

We have developed two compact plasma focus devices operating in neon with high repetition rate capacity to be used as a repetitive pulse soft x-ray (SXR) source for lithography. A single capacitor module 1-1-1 was used to test high repetitive rate capability and was observed to produce soft x-rays in the wavelength range of 0.8-1.4 nm at up to 10 Hz. The discharge current rises in 1.2 us to peak value of 140 kA at 15 kV charge. The soft x-ray yield varies with the pressure of working gas, the value and polarity of voltage applied to capacitor.On the basis of this module we have designed a our module test system for SXR designated as the NX1. The peak discharge current is 270 kA when the capacitor bank is charged to 12kV. It produces 100J of soft x-ray per shot in single shot mode, in the wavelength range of 0.8 to 1.4nm and a spot size of below 1mm viewed end on. With a repetitive rate of up to 3Hz this gives 300W of average SXR power. The NX2 is a second system that has been designed and constructed. It will be operated at peak currents in excess of 300kA into water-cooled electrodes at repetitive rates up to 20Hz to produce 300W SXR in burst durations of up to 5 minutes. It is estimated that with such a SXR yield into a well designed beamline and a reasonably sensitive resist an exposure could be made in less than 10 seconds. Pushing such x-ray sources further to 2 kW output will make their intensity sufficient for SXR lithography with reasonably high throughput to be of industrial interest.

Paper Details

Date Published: 14 August 1997
PDF: 11 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280531
Show Author Affiliations
Sing Lee, Nanyang Technological Univ. (Singapore)
Paul Choon Keat Lee, Nanyang Technological Univ. (Singapore)
Guan Zhang, Nanyang Technological Univ. (Singapore)
X. Feng, Nanyang Technological Univ. (Singapore)
Adrian Serban, Nanyang Technological Univ. (Singapore)
Mahe Liu, Nanyang Technological Univ. (Singapore)
Terence Kin Shun Wong, Nanyang Technological Univ. (Singapore)
C. Selvam, Nanyang Technological Univ. (Singapore)
A. Thang, Nanyang Technological Univ. (Singapore)

Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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