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Proceedings Paper

193-nm excimer laser microstepper system
Author(s): Nadeem Hasan Rizvi; Julian S. Cashmore; Chris M. Solomon; Phil T. Rumsby; Malcolm C. Gower
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Paper Abstract

An excimer laser microstepper, intended for R and D studies of 193nm lithography, is described. System details such as the laser performance, beam transport, wafer handling and photoresist processes are outlined.

Paper Details

Date Published: 14 August 1997
PDF: 8 pages
Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); doi: 10.1117/12.280529
Show Author Affiliations
Nadeem Hasan Rizvi, Exitech Ltd. (United Kingdom)
Julian S. Cashmore, Exitech Ltd. (United Kingdom)
Chris M. Solomon, Exitech Ltd. (United Kingdom)
Phil T. Rumsby, Exitech Ltd. (United Kingdom)
Malcolm C. Gower, Exitech Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 3183:
Microlithographic Techniques in IC Fabrication
Soon Fatt Yoon; Raymond Yu; Chris A. Mack, Editor(s)

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