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Proceedings Paper

Optics applications of chemical vapor deposited beta-SiC
Author(s): Jitendra S. Goela; Michael A. Pickering
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Paper Abstract

The fabrication process, properties and optics applications of transparent and opaque chemical vapor deposited (CVD) (3-SiC are reviewed. CVD-SiC is produced by the pyrolysis of methyltrichlorosilane, in excess H2, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter upto 1.5-m and thickness 2.5-cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicates that it is a superior material for optics applications. Important properties of CVD-SiC are compared with those of the other candidate mirror and window materials. The applications of CVDSiC for lightweight optics, x-ray telescopes, optical baffles, lens molds, optical standards and windows and domes are discussed in detail.

Paper Details

Date Published: 28 July 1997
PDF: 34 pages
Proc. SPIE 10289, Advanced Materials for Optics and Precision Structures: A Critical Review, 1028908 (28 July 1997); doi: 10.1117/12.279816
Show Author Affiliations
Jitendra S. Goela, Morton International, Inc. (United States)
Michael A. Pickering, Morton International, Inc. (United States)

Published in SPIE Proceedings Vol. 10289:
Advanced Materials for Optics and Precision Structures: A Critical Review
Mark A. Ealey; Roger A. Paquin; Thomas B. Parsonage, Editor(s)

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