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Proceedings Paper

Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems
Author(s): Stanislav N. Jatchmenev; Alexander A. Chinenov
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Paper Abstract

Jon Projection Lithography is depended on successful realization of system project. Very critical parameter of optical image limiting permissible work field is a distortion. A peculiarity of distortion is in exceptional significance of a fiveorder aberration in optimum state oftuning, when there is a circumference of zero-distortion. This state very sensitive to any perturbations. It has worked out a conception of design taking account the main possible sources of perturbation and means of its restrictions. This means includes above all a correction by multipoles and next now the tolerances considering a presence of multipoles. Important role in the process is assigned to an ifiumination part of optical system. Keywords: Ion Projection, Distortion, Tolerances, Integral equations.

Paper Details

Date Published: 25 September 1997
PDF: 13 pages
Proc. SPIE 3155, Charged Particle Optics III, (25 September 1997); doi: 10.1117/12.279399
Show Author Affiliations
Stanislav N. Jatchmenev, RIMOS Research and Development Ctr. (Russia)
Alexander A. Chinenov, RIMOS Research and Development Ctr. (Russia)


Published in SPIE Proceedings Vol. 3155:
Charged Particle Optics III
Eric Munro, Editor(s)

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