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Proceedings Paper

Cleaning technology of PSM for sub-quarter-micron devices
Author(s): Hitoshi Handa; Masumi Takahashi; Yutaka Miyahara
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Paper Abstract

Cleaning of PSM is one of the most important technology for the development and production of quarter micron devices. In cleaning of PSM, it is needed not only to remove the particles on shifter and quartz, but also not to change the phase angle and the transmittance. For this purpose, new technology of PSM cleaning has been developed. Through the cleaning of 'MoSiON- halftone,' effectiveness of our techniques is shown.

Paper Details

Date Published: 28 July 1997
PDF: 9 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277298
Show Author Affiliations
Hitoshi Handa, Fujitsu Ltd. (Japan)
Masumi Takahashi, Fujitsu VLSI Ltd. (Japan)
Yutaka Miyahara, Fujitsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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