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Proceedings Paper

Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks
Author(s): Kyoji Nakajo; Junya Sakemi; Akemi Moniwa; Tsuneo Terasawa; Norio Hasegawa; Eiji Tsujimoto
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Paper Abstract

A fast automated method to detect sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks has been developed. This method approximates the sidelobe images by polygons, on which pattern operations are applied to quickly detect areas of overlap where unexpected images may occur. The feasibility of this method was demonstrated using hole patterns which contained 1.48 million pattern features. Calculation time was 4.3 hours, which was almost 3,500 times faster than aerial image simulation.

Paper Details

Date Published: 28 July 1997
PDF: 9 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277292
Show Author Affiliations
Kyoji Nakajo, Hitachi ULSI Engineering Corp. (Japan)
Junya Sakemi, Hitachi ULSI Engineering Corp. (Japan)
Akemi Moniwa, Hitachi, Ltd. (Japan)
Tsuneo Terasawa, Hitachi, Ltd. (Japan)
Norio Hasegawa, Hitachi, Ltd. (Japan)
Eiji Tsujimoto, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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