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Proceedings Paper

Development of an in-situ cleaning system for an e-beam reticle writer
Author(s): Kenji Ohtoshi; Satoshi Yamasaki; Shuichi Tamamushi; Toru Tojo; Ryoichi Hirano; Yuuji Fukudome; Naoharu Shimomura; Shinsuke Nishimura; Shusuke Yoshitake; Munehiro Ogasawara
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Paper Abstract

We have newly designed and constructed a unique electron optical column installed with an in-situ cleaning system, applying the down-flow ashing process with a mixture O2 and CF4. We carried out in-situ cleaning using designed system, and confirmed that beam drift which is caused by charging up of a contamination layer was reduced.

Paper Details

Date Published: 28 July 1997
PDF: 4 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277287
Show Author Affiliations
Kenji Ohtoshi, Toshiba Machine Co., Ltd. (Japan)
Satoshi Yamasaki, Toshiba Machine Co., Ltd. (Japan)
Shuichi Tamamushi, Toshiba Machine Co., Ltd. (Japan)
Toru Tojo, Toshiba Machine Co., Ltd. (Japan)
Ryoichi Hirano, Toshiba Machine Co., Ltd. (Japan)
Yuuji Fukudome, Toshiba Corp. (Japan)
Naoharu Shimomura, Toshiba Corp. (Japan)
Shinsuke Nishimura, Toshiba Corp. (Japan)
Shusuke Yoshitake, Toshiba Corp. (Japan)
Munehiro Ogasawara, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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