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Proceedings Paper

0.35-um i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology
Author(s): Mark L. Raphaelian; M. F. Ellis; David C. Ferranti; Diane K. Stewart
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Paper Abstract

This paper addresses the capabilities of the Micrion 8000 FIB (focused ion beam) phase shift mask repair tool to repair clear defects and opaque defects found on chrome-based binary and attenuated phase shift masks, and MoSi-based attenuated phase shift masks for 0.35 micrometer lithography. For a repair to be successful, the repair must: match size, shape, and position of the defect, reproduce the desired transmission, minimize damage to the underlying substrate, minimize damage to surrounding non-defect areas, and finally, the repair must be durable. For the production environment, a repair tool must be very reliable and easy to use as well. The Micrion 8000 FIB phase shift mask repair tool incorporates the above requirements.

Paper Details

Date Published: 28 July 1997
PDF: 15 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277283
Show Author Affiliations
Mark L. Raphaelian, Micrion Corp. (United States)
M. F. Ellis, Micrion Corp. (United States)
David C. Ferranti, Micrion Corp. (United States)
Diane K. Stewart, Micrion Corp. (United States)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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