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Proceedings Paper

Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask
Author(s): Shoichi Hirooka; Shigeru Hasebe; Tomohiro Tsutsui; Shigeki Nojima; Hisako Aoyama; Hidehiro Watanabe
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Paper Abstract

Critical dimension error on a wafer caused by leaking light through embedded shifter type opaque ring on an i-line attenuated phase-shift mask has been studied. We have produced the mask that includes small pinhole-array pattern as the opaque ring, and confirm that transmittance through the opaque ring depends on pinhole size in good agreement with coherent theory. Our experimental result shows that the leakage must be less than 0.125% in transmittance in order to control resist dimension error less than 0.01 micrometer on a wafer for 0.35 - 0.4 micrometer devices. We have also derived an analytical form to represent leaking light, which shows good fit to the transmittance measurements with the various pinhole size. Then we have estimated the allowable error in phase difference and transmittance of the shifter, and that in pinhole size, applying for this formula. We also discuss the process feasibility for embedded shifter type opaque ring.

Paper Details

Date Published: 28 July 1997
PDF: 10 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277279
Show Author Affiliations
Shoichi Hirooka, Toshiba Corp. (Japan)
Shigeru Hasebe, Toshiba Corp. (Japan)
Tomohiro Tsutsui, Toshiba Corp. (Japan)
Shigeki Nojima, Toshiba Corp. (Japan)
Hisako Aoyama, Toshiba Corp. (Japan)
Hidehiro Watanabe, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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