Share Email Print

Proceedings Paper

Advanced mask metrology system for up to 4-Gbit DRAM
Author(s): Taro Ototake; Eiji Matsubara; Keiichi Hosoi
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Photolithography using photomasks will be used for at least up to the 4 Gbit DRAM generation. For these advanced photomasks, higher performance will be demanded from the mask metrology system. The metrology system must satisfy performance criteria such as higher measurement accuracy, handling capability for larger reticles (9' by 9') and so forth, because the pattern rule for reticles will be tighter and the exposure field area will grow in the next generation. Nikon Corporation has been providing a mask metrology system, the XY-5i which can be used for up to the 1 Gbit DRAM generation. In order to meet the above mentioned required performance for the next generation system, Nikon has developed a new metrology system, the XY-6i. The XY-6i has higher measurement accuracy and resolution for pattern coordinates and critical dimensions on reticles and can also measure wafers and next generation reticles (9' by 9') automatically.

Paper Details

Date Published: 28 July 1997
PDF: 11 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277269
Show Author Affiliations
Taro Ototake, Nikon Corp. (Japan)
Eiji Matsubara, Nikon Corp. (Japan)
Keiichi Hosoi, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

© SPIE. Terms of Use
Back to Top