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Proceedings Paper

New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs
Author(s): Mitsuo Tabata; Kyoji Yamashita; Hideo Tsuchiya; Takehiko Nomura; Hiromu Inoue; Tomohide Watanabe; Toru Tojo; Hisakazu Yoshino
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Paper Abstract

For mask defect inspection in 256 Mbit and 1 Gbit DRAMs, it is necessary to have high sensitivity of 0.2 - 0.1 micrometer. A new die-to-database mask inspection system MC-2000 for 256 Mbit and 1 Gbit DRAMs has been developed. This system has high resolution optics with i-line light and high NA lens, and high speed and high accuracy data processing circuit by new multilevel bit map pattern generator, so the system has both high detectability and high throughput. This paper describes system configuration which include optical system and mechanical system, the defect inspection method, and inspection performance including defect sensitivity.

Paper Details

Date Published: 28 July 1997
PDF: 8 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277266
Show Author Affiliations
Mitsuo Tabata, Toshiba Corp. (Japan)
Kyoji Yamashita, Toshiba Corp. (Japan)
Hideo Tsuchiya, Toshiba Corp. (Japan)
Takehiko Nomura, Toshiba Corp. (Japan)
Hiromu Inoue, Toshiba Corp. (Japan)
Tomohide Watanabe, Toshiba Corp. (Japan)
Toru Tojo, Toshiba Machine Corp. (Japan)
Hisakazu Yoshino, Topcon Corp. (Japan)


Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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