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Proceedings Paper

Antireflection and opaque coating film materials for Ta/SiC x-ray masks
Author(s): Yoshihisa Iba; Fumiaki Kumasaka; Hajime Aoyama; Takao Taguchi; Masaki Yamabe
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Paper Abstract

An opaque film coating and an anti-reflection (AR) film coating of x-ray masks are essential in order to get a higher alignment accuracy in optical heterodyne alignment systems. Not only the optical characteristics of the films, but also the stress and the durability in cleaning processes are important issues for the films. We investigated various materials from the viewpoints of the refractive index-matching with SiC, stress controllability and stability to a strong acid, an we have developed a material suitable for use with a Ta/SiC x-ray mask. We found that a sputtered Zr and Si compound oxide film fulfills the requirements of the AR film. We also found that a sputtered Ta film can be used as the opaque film, and we enhanced the diffraction efficiency of a mask mark by coating the AR film before coating the Ta opaque film on the mask mark.

Paper Details

Date Published: 28 July 1997
PDF: 5 pages
Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); doi: 10.1117/12.277257
Show Author Affiliations
Yoshihisa Iba, Fujitsu Labs. Ltd. (Japan)
Fumiaki Kumasaka, Fujitsu Labs. Ltd. (Japan)
Hajime Aoyama, Fujitsu Labs. Ltd. (Japan)
Takao Taguchi, Fujitsu Labs. Ltd. (Japan)
Masaki Yamabe, Fujitsu Labs. Ltd. (Japan)


Published in SPIE Proceedings Vol. 3096:
Photomask and X-Ray Mask Technology IV
Naoaki Aizaki, Editor(s)

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