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Proceedings Paper

Synthesis and characterization of carbon nitride films
Author(s): Linda F. Johnson; Mark B. Moran
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Paper Abstract

Carbon nitride films were deposited on a variety of substrates by electron cyclotron resonance (ECR) chemical vapor deposition (CVD) using halogenated hydrocarbon precursors in a high-density-nitrogen plasma. With the proper deposition conditions, the chlorine-doped carbon nitride films are conformal, extremely smooth and uniform over large areas. Deposition rates in the 5-kilowatt ECR-CVD chamber of up to ten microns per hour over a four-inch-diameter substrate have been demonstrated. Low-melting substrates like plastics and low-melting glasses have been coated because the deposition temperatures can be kept below 100 degrees Celsius in the streaming plasma of the ECR-CVD. Film microstructure and chemical composition were studied using atomic force microscopy (AFM), auger spectroscopy, electron spectroscopy for chemical analysis (ESCA) and Fourier transform infrared (FTIR) spectroscopy. Preliminary results indicate that the carbon nitride coatings deposited using halogenated- hydrocarbon precursors contain less than ten atomic percent chlorine and very little carbon-hydrogen bonding. One set of experimental conditions resulted in the deposition of 100- micron-size crystallites on a glass substrate.

Paper Details

Date Published: 27 June 1997
PDF: 12 pages
Proc. SPIE 3060, Window and Dome Technologies and Materials V, (27 June 1997); doi: 10.1117/12.277063
Show Author Affiliations
Linda F. Johnson, Naval Air Warfare Ctr. (United States)
Mark B. Moran, Naval Air Warfare Ctr. (United States)


Published in SPIE Proceedings Vol. 3060:
Window and Dome Technologies and Materials V
Randal W. Tustison, Editor(s)

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