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Proceedings Paper

Structural characteristics and applications of zirconium dioxide formed by super-high-speed thermal treatment
Author(s): L. M. Lynkov; V. V. Soloviev; S. V. Zhdanovich; N. P. Petrov; V. A. Bogush
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Paper Abstract

The results of x-ray diffraction and Auger spectroscopy of zirconium dioxide thin films are presented. These methods were used for studying the structural properties of zirconium dioxide thin films depending on the time and temperature range of thermal treatment. Super high-speed thermal treatment of metalorganic compositions of zirconium alcoholic solutions, Zr thin films and Zr anodic oxides thin films has been applied to prepare the samples which were annealed during 1-10s in situ at T equals 500 degrees C and higher at the rate of 80-250 degrees C/s with the following gradual cooling to the room temperature. The formed thin films have the following texture degree: anodic gradual cooling to the room temperature. The formed thin films have the following texture degree: anodic ZrO2(Y2O3) - 98 percent. ZrO2 formed by oxidation of Zr thin films - 71 percent, ZrO2 formed from Zr metalorganic compositions - 100 percent. Auger analysis showed that anodic ZrO2 thin films had the best barrier properties.

Paper Details

Date Published: 13 June 1997
PDF: 4 pages
Proc. SPIE 3179, Solid State Crystals in Optoelectronics and Semiconductor Technology, (13 June 1997); doi: 10.1117/12.276222
Show Author Affiliations
L. M. Lynkov, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)
V. V. Soloviev, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)
S. V. Zhdanovich, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)
N. P. Petrov, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)
V. A. Bogush, Belarusian State Univ. of Informatics and Radioelectronics (Belarus)


Published in SPIE Proceedings Vol. 3179:
Solid State Crystals in Optoelectronics and Semiconductor Technology
Antoni Rogalski; Jaroslaw Rutkowski; Andrzej Majchrowski; Jerzy Zielinski, Editor(s)

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