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Proceedings Paper

Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography
Author(s): Chongxi Zhou; Dajian Lin; HanMin Yao
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Paper Abstract

In this paper, the principle of two typical i-line ((lambda) equals 365 nm) and excimer laser ((lambda) equals 248 nm) uniform illumination optical systems based on Cohler illumination is reviewed, the principle and method of the calculation and simulation of intensity distribution of the illumination system for sub-micron photolithography consisting of aspherical surfaces, non-co-axial surfaces and lens array are put forward, that is ray-tracing based on the Snell theorem and spot diagram. At the same time, a program CALOSD made by us is described, two typical results of calculation and simulation of intensity distribution of illumination optical systems are given.

Paper Details

Date Published: 7 July 1997
PDF: 6 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276059
Show Author Affiliations
Chongxi Zhou, Institute of Optics and Electronics (China)
Dajian Lin, Institute of Optics and Electronics (China)
HanMin Yao, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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