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Proceedings Paper

Submicron DUV lithography using second-harmonic light of copper vapor laser
Author(s): Huijie Huang; Dunwu Lu; Hongwu Ren; Peihui Liang; Longlong Du
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Paper Abstract

In order to study the feasibility of submicron lithography using second-harmonic light (SHL) at wavelength of 255.3 nm of copper vapor laser (CVL), a 1:1 catadioptric projection lens and an illumination system are designed and constructed. A resolution of 0.7 micrometers line/space patterns is produced in AZ1350J resist, which reveals that the SHL of CVL can be used as an illumination source in submicron lithography.

Paper Details

Date Published: 7 July 1997
PDF: 5 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276054
Show Author Affiliations
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Dunwu Lu, Shanghai Institute of Optics and Fine Mechanics (China)
Hongwu Ren, Shanghai Institute of Optics and Fine Mechanics (China)
Peihui Liang, Shanghai Institute of Optics and Fine Mechanics (China)
Longlong Du, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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