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Proceedings Paper

Optical microlithography with nearly nondiffracting beams
Author(s): Miklos Erdelyi; Zoltan L. Horvath; Zsolt Bor; Gabor Szabo; Joseph R. Cavallaro; Michael C. Smayling; Frank K. Tittel
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Paper Abstract

A new concept based on a Fabry-Perot interferometer for the generation of nearly nondiffracting Bessel beams is described experimentally and theoretically, and proposed for potential applications in microlithography such as the fabrication of small isolated patterns. It was demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this technique to image contact holes. The theoretical curves show very good agreement with the measured intensity distribution. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimentally that even in the most critical case (when the first diffraction rings overlap), undesirable interference effects between the adjacent contact holes can be eliminated by means of a phase shifting technique.

Paper Details

Date Published: 7 July 1997
PDF: 8 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276053
Show Author Affiliations
Miklos Erdelyi, JATE Univ. (Hungary)
Zoltan L. Horvath, JATE Univ. (Hungary)
Zsolt Bor, JATE Univ. (Hungary)
Gabor Szabo, JATE Univ. (Hungary)
Joseph R. Cavallaro, Rice Univ. (United States)
Michael C. Smayling, Rice Univ. (United States)
Frank K. Tittel, Rice Univ. (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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