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Proceedings Paper

Real-time stage position measurement with nanometer-scale accuracy
Author(s): Philip D. Henshaw; Donald P. DeGloria; Sandra A. Kelly; Robert F. Dillon
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Paper Abstract

Air turbulence affects the performance of the Helium-Neon interferometer used to control the wafer stage of stepper or step-and-scan lithography systems. In this paper, we describe characterization and reduction of the major error sources in an Air Turbulence Compensated Interferometer designed to address this problem.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276047
Show Author Affiliations
Philip D. Henshaw, SPARTA, Inc. (United States)
Donald P. DeGloria, SPARTA, Inc. (United States)
Sandra A. Kelly, SPARTA, Inc. (United States)
Robert F. Dillon, Lumen Labs., Inc. (United States)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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