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Proceedings Paper

Analysis of nonlinear overlay errors by aperture mixing related with pattern asymmetry
Author(s): Chang-Moon Lim; Ki-Sung Kwon; Donggyu Yim; Dong-Hwan Son; Hyeong-Soo Kim; Ki-Ho Baik
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Paper Abstract

Modified illumination scheme such as off-axis illumination or low partial coherence illumination in combination with phase shift mask is very reliable technique even to the manufacturing stage. In spite of its benefit of drastic improvements in resolution and depth of focus, it has several well known drawbacks. Those are pattern structure dependency, increased proximity effect and significant degradation of illumination power. Furthermore, several studies are reported about the distortion-like registration error between each illumination aperture while various apertures are mix-used. However, the origin of this distortion-like overlay errors is still uncertain and just considered as having some relationship with lens aberration probably, coma. In this study, we investigated the nonlinear character of the registration errors and try to find out the implicit relations of its to the lens aberration character through experiments and simulations.

Paper Details

Date Published: 7 July 1997
PDF: 10 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276014
Show Author Affiliations
Chang-Moon Lim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Sung Kwon, Hyundai Electronics Industries Co.,Ltd. (South Korea)
Donggyu Yim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Dong-Hwan Son, Hyundai Electronics Industries Co., Ltd. (South Korea)
Hyeong-Soo Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Ho Baik, Hyundai Electronics Industries Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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