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Proceedings Paper

ArF excimer laser lithography using monochromatic projection lens coupled with narrowed-bandwidth laser
Author(s): Jun-ichi Yano; Shinji Ito; Hitoshi Sekita; Akifumi Tada; Yukio Ogura
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Paper Abstract

We have developed an ArF excimer laser exposure system that combines a monochromatic quartz projection lens system and a spectrally-narrowed ArF excimer laser. The bandwidth of the laser was narrowed to 0.7 pm by using three prisms and an etalon. We fabricated 0.12 micrometers lines-and-spaces using an alternating phase shifting mask and a top surface imaging resist.

Paper Details

Date Published: 7 July 1997
PDF: 8 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276011
Show Author Affiliations
Jun-ichi Yano, NEC Corp. (Japan)
Shinji Ito, NEC Corp. (Japan)
Hitoshi Sekita, NEC Corp. (Japan)
Akifumi Tada, NEC Corp. (Japan)
Yukio Ogura, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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