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Proceedings Paper

Subpicometer ArF excimer laser for 193-nm lithography
Author(s): Jun Akita; Hiroshi Komori; Noriaki Kouda; Shunsuke Yoshioka; Yasuo Itakura; Hakaru Mizoguchi
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Paper Abstract

Highly narrowed Argon Fluoride excimer laser for practical refractive exposure system with high NA and wide field size lenses is developed. The laser realizes 0.6 W at 400 Hz. The spectral bandwidth is less than 0.75 pm, the stability of central wavelength is within +/- 0.25 pm and the concentration of energy within 3- pm band is more than 95%. The gas lifetime is more than 1 X 107 pulses without gas purifier. By the one gas life performance test and the short term performance test, we confirm this laser is useful for the development of microlithography process.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276010
Show Author Affiliations
Jun Akita, Komatsu Ltd. (Japan)
Hiroshi Komori, Komatsu Ltd. (Japan)
Noriaki Kouda, Komatsu Ltd. (Japan)
Shunsuke Yoshioka, Komatsu Ltd. (Japan)
Yasuo Itakura, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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