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Proceedings Paper

Performance of excimer lasers as light sources for 193-nm lithography
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Paper Abstract

The performance of argon fluoride excimer lasers is an important issue in determining the practical feasibility of 193-nm exposure systems. This paper presents a summary of the experience gained at MIT Lincoln Laboratory regarding the long-term performance of 193-nm lasers, used under conditions similar to those expected in production-type lithographic systems.

Paper Details

Date Published: 7 July 1997
PDF: 8 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276008
Show Author Affiliations
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Scott P. Doran, MIT Lincoln Lab. (United States)
Michael Fritze, MIT Lincoln Lab. (United States)
Roderick R. Kunz, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Ray S. Uttaro, MIT Lincoln Lab. (United States)
Daniel A. Corliss, SEMATECH (United States)

Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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