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Proceedings Paper

Reduction of mask-error effect utilizing pupil filter in alternative phase-shift lithography
Author(s): Shuji Nakao; Akihiro Nakae; Kouichirou Tsujita; Yasuji Matsui
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Paper Abstract

A novel method to reduce a mask error effect in alternative phase shift lithography is proposed, which is derived from the analysis of the pupil plane images generated by masks with and without error. The analysis shown that zeroth order diffraction light, which usually shows zero intensity for precisely formed mask with the same areas for phased and non-phased openings, is generated by mask error both in phase and transmission. So, applying a pupil filter that cuts off rays passing through the central part of pupil is considered to be effective for the reduction of mask error effect. Impacts of the pupil filtering on imaging were evaluated by the numerical calculations of aerial images for various masks and results revealed that by applying a circular pupil filter with same radius as that of non- diffracted illumination image, tolerance in phase and transmission error for L/S patterns enlarged up to 20 degree and 50%, respectively.

Paper Details

Date Published: 7 July 1997
PDF: 8 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276004
Show Author Affiliations
Shuji Nakao, Mitsubishi Electric Corp. (Japan)
Akihiro Nakae, Mitsubishi Electric Corp. (Japan)
Kouichirou Tsujita, Mitsubishi Electric Corp. (Japan)
Yasuji Matsui, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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