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Proceedings Paper

Performance of a step-and-scan system for DUV lithography
Author(s): Gerard de Zwart; Martin A. van den Brink; Richard A. George; Danu Satriasaputra; Jan Baselmans; H. Butler; Jan B.P. van Schoot; Jos de Klerk
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Paper Abstract

To meet the high productivity standards, set by current top- end stepper systems, the use of excimer laser sources and high scanning speeds are essential. This paper reports on a new Step & Scan system capable of exposing 26 X 33 mm fields, using a 248 nm DUV-lens with a variable Numerical Aperture of 0.40 to 0.63. The system is equipped with an advanced AERIALTM illuminator which allows the user to choose coherence and illumination modes on a job-by-job basis. The double telecentric lens is equipped with lens manipulators to allow on-site aberration control. Results are presented on dynamic image distortion, field flatness and dynamic imaging performance. Performance of the overlay accuracy and dose accuracy at high scanning speeds proves that Step & Scan technology is now developed to a level suitable for use in high volume sub 0.25 micrometers manufacturing.

Paper Details

Date Published: 7 July 1997
PDF: 19 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276002
Show Author Affiliations
Gerard de Zwart, ASM Lithography BV (Netherlands)
Martin A. van den Brink, ASM Lithography BV (Netherlands)
Richard A. George, ASM Lithography BV (Netherlands)
Danu Satriasaputra, ASM Lithography BV (Netherlands)
Jan Baselmans, ASM Lithography BV (Netherlands)
H. Butler, ASM Lithography BV (Netherlands)
Jan B.P. van Schoot, ASM Lithography BV (Netherlands)
Jos de Klerk, ASM Lithography BV (Netherlands)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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