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Proceedings Paper

Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool
Author(s): Daniel R. Cote; Keith W. Andresen; David J. Cronin; Hilary G. Harrold; Marc D. Himel; J. Kane; Joe Lyons; Louis Markoya; Christopher J. Mason; Diane C. McCafferty; Matthew E. McCarthy; Geoffrey O'Connor; Harry Sewell; David M. Williamson
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Paper Abstract

The evolution of microlithography to 0.25 micrometers and below has driven the need for performance enhancements in several critical areas. Among these are imaging, illumination, and overlay. This paper briefly reviews MicrascanTM III system concepts. The main body of the paper presents system level performance and discusses the key subsystems which enable 0.25 micron imaging and 55 nm overlay. Autocal, MicrascanTM III's image, reticle and wafer position reference subsystem is discussed with respect to functionality and performance with a pulsed illumination source. MicrascanTM III illuminator performance, including automated off axis illumination module are presented. Performance of the magnetically levitated Monostage and its interaction with overlay and imaging is discussed. System performance with respect to resolution, image quality and overlay on product levels is presented and analyzed.

Paper Details

Date Published: 7 July 1997
PDF: 11 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276001
Show Author Affiliations
Daniel R. Cote, SVG Lithography Systems, Inc. (United States)
Keith W. Andresen, SVG Lithography Systems, Inc. (United States)
David J. Cronin, SVG Lithography Systems, Inc. (United States)
Hilary G. Harrold, SVG Lithography Systems, Inc. (United States)
Marc D. Himel, SVG Lithography Systems, Inc. (United States)
J. Kane, SVG Lithography Systems, Inc. (United States)
Joe Lyons, SVG Lithography Systems, Inc. (United States)
Louis Markoya, SVG Lithography Systems, Inc. (United States)
Christopher J. Mason, SVG Lithography Systems, Inc. (United States)
Diane C. McCafferty, SVG Lithography Systems, Inc. (United States)
Matthew E. McCarthy, SVG Lithography Systems, Inc. (United States)
Geoffrey O'Connor, SVG Lithography Systems, Inc. (United States)
Harry Sewell, SVG Lithography Systems, Inc. (United States)
David M. Williamson, SVG Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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