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Proceedings Paper

Photoresist materials: a historical perspective
Author(s): C. Grant Willson; Ralph R. Dammel; Arnost Reiser
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Paper Abstract

This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800's to today's efforts to develop 193 nm resist materials.

Paper Details

Date Published: 7 July 1997
PDF: 14 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275984
Show Author Affiliations
C. Grant Willson, Univ. of Texas/Austin (United States)
Ralph R. Dammel, Hoechst Celanese Corp. (United States)
Arnost Reiser, Polytechnic Univ. (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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