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Proceedings Paper

Spatial-filter models to describe IC lithographic behavior
Author(s): John P. Stirniman; Michael L. Rieger
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Paper Abstract

Proximity correction systems require an accurate, fast way to predict how a pattern configuration will transfer to the wafer. In this paper we present an efficient method for modeling the pattern transfer process based on Dennis Gabor's `theory of communication'. This method is based on a `convolution form' where any 2D transfer process can be modeled with a set of linear, 2D spatial filters, even when the transfer process is non-linear. We will show that this form is a general case from which other well-known process simulation models can be derived. Furthermore, we will demonstrate that the convolution form can be used to model observed phenomena, even when the physical mechanisms involved are unknown.

Paper Details

Date Published: 7 July 1997
PDF: 10 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275978
Show Author Affiliations
John P. Stirniman, Precim Corp. (United States)
Michael L. Rieger, Precim Corp. (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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