Share Email Print
cover

Proceedings Paper

NA/sigma optimization strategies for an advanced DUV stepper applied to 0.25- and sub-0.25-um critical levels
Author(s): Maaike Op de Beeck; Kurt G. Ronse; Kouros Ghandehari; Patrick Jaenen; Harry Botermans; Jo Finders; John A. Lilygren; Daniel Claire Baker; Geert Vandenberghe; Peter De Bisschop; Mireille Maenhoudt; Luc Van den Hove
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this paper, the results of an NA-sigma optimization study are reported, carried out experimentally for an advanced ASML PAS5500/300 deep-UV stepper. The work has been primarily focused on a 0.25 and sub-0.25 micrometers gate layer in a logic CMOS process. A positive and negative tone resist process have been compared in terms of CD control and line- end shortening. Dry etch effects and across-field behavior has been taken into account. Furthermore the contact level of the 0.25 micrometers process have been optimized. Effects of layer dependent NA-sigma settings on overlay have been studied.

Paper Details

Date Published: 7 July 1997
PDF: 13 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275973
Show Author Affiliations
Maaike Op de Beeck, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Kurt G. Ronse, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Kouros Ghandehari, Interuniv. Micro-Electronica Centrum vzw (Belgium)
Patrick Jaenen, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Harry Botermans, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Jo Finders, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
John A. Lilygren, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Daniel Claire Baker, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Geert Vandenberghe, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Peter De Bisschop, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Mireille Maenhoudt, Interuniv. Micro-Elektronica Centrum vzw (Belgium)
Luc Van den Hove, Interuniv. Micro-Elektronica Centrum vzw (Belgium)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

© SPIE. Terms of Use
Back to Top