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Proceedings Paper

Compaction of fused silica under low-fluence/long-term 193-nm irradiation
Author(s): Charlene M. Smith; Nicholas F. Borrelli; Douglas C. Allan; Thomas P. Seward
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Paper Abstract

The compaction (densification) of fused silica under low fluence (< 1 mJ/cm2/pulse), long term (hundreds of millions of pulses) 193 nm irradiation has been studied. With the use of a finite element analysis, the unconstrained densification, (delta) (rho) /(rho) , is extracted from the experimentally determined wavefront distortion. We find that the densification of silica in the low fluence exposure regime corresponds to what is predicted from the behavior described by: (delta) (rho) /(rho) equals 0.000117 (NI2)0.53 where N equals number of pulses, I equals intensity (mJ/cm2/pulse). Results are presented of high and low intensity studies that establish the utility of the above form as a predictive tool for densification in fused silica.

Paper Details

Date Published: 7 July 1997
PDF: 6 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275970
Show Author Affiliations
Charlene M. Smith, Corning Inc. (United States)
Nicholas F. Borrelli, Corning Inc. (United States)
Douglas C. Allan, Corning Inc. (United States)
Thomas P. Seward, Corning Inc. (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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