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Proceedings Paper

Characterization of autofocus uniformity and precision on ASML steppers using the phase-shift focus monitor reticle
Author(s): Richard D. Edwards; Paul W. Ackmann; Christine Fischer; Mark Desrocher; Mark Puzerewski
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Paper Abstract

This paper details a method that was used to evaluate and characterize autofocus uniformity and repeatability issues which were exhibited on ASML 5500/100 Stepper systems at Advanced Micro Devices in Austin, Texas. Equally significant is the process by which these issues were resolved through a cooperative effort with ASM Lithography, which is also discussed. Data shown in this paper was collected using the Phase Shift Focus Monitor Reticle, produced by Benchmark Technologies. The coactive relationship between ASML and AMD was integral in identifying the cause of this long-standing condition, as well as providing and implementing the required solution.

Paper Details

Date Published: 7 July 1997
PDF: 8 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275969
Show Author Affiliations
Richard D. Edwards, Advanced Micro Devices, Inc. (United States)
Paul W. Ackmann, Advanced Micro Devices, Inc. (United States)
Christine Fischer, Advanced Micro Devices, Inc. (United States)
Mark Desrocher, ASM Lithography (United States)
Mark Puzerewski, ASM Lithography (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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