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Proceedings Paper

Phase-shift focus monitor applications to lithography tool control
Author(s): Donald C. Wheeler; Eric P. Solecky; T. Dinh; Rebecca D. Mih
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Paper Abstract

Through the use of phase shift techniques, focus errors have been demonstrated to result in easily measurable overlay shifts in printed resist patterns. Using box-in-box with phase shifter design, patterns are printed on wafers and measured on standard overlay equipment. Results are compared to more conventional methods of focus detection. Details include measurement and calibration methodology, focus, and focus tilt results. Additionally, SPC in IBM's ASTC Fab is demonstrated with the Phase Shift Focus Monitor.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275968
Show Author Affiliations
Donald C. Wheeler, IBM Microelectronics (United States)
Eric P. Solecky, IBM Microelectronics (United States)
T. Dinh, IBM Microelectronics (United States)
Rebecca D. Mih, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 3051:
Optical Microlithography X
Gene E. Fuller, Editor(s)

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