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Proceedings Paper

Method to characterize overlay tool misalignments and distortions
Author(s): Richard M. Silver; James E. Potzick; Fredric Scire; Christopher J. Evans; M. McGlauflin; Edward Kornegay; Robert D. Larrabee
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Paper Abstract

A new optical alignment artifact under development at NIST is described. This artifact, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We outline the design criteria and diamond turning lathe techniques used for manufacturing this structure. The alignment methods using this artifact allow the separation of error components associated with the optical system or the mechanical positioning systems as encountered when performing measurements in different focal planes.Although some difficulties have been encountered when performing measurements in different focal planes. Although some difficulties have been encountered in the actual diamond turning process,the data presented show some improvements with the more recent prototypes which indicate that this method of fabrication will be useful. Photometer scan data and CCD image acquisition hardware show a significant optical response at the step edges from these structures. Initial analysis of the optical response of these edges shows sensitivity to the material used and the details of the manufacturing processes.

Paper Details

Date Published: 7 July 1997
PDF: 13 pages
Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275965
Show Author Affiliations
Richard M. Silver, National Institute of Standards and Technology (United States)
James E. Potzick, National Institute of Standards and Technology (United States)
Fredric Scire, National Institute of Standards and Technology (United States)
Christopher J. Evans, National Institute of Standards and Technology (United States)
M. McGlauflin, National Institute of Standards and Technology (United States)
Edward Kornegay, National Institute of Standards and Technology (United States)
Robert D. Larrabee, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 3050:
Metrology, Inspection, and Process Control for Microlithography XI
Susan K. Jones, Editor(s)

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