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Proceedings Paper

Highly accurate CD measurement with a micro standard
Author(s): Katsuhiro Sasada; Nobuyoshi Hashimoto; Hiroyoshi Mori; Tadashi Ohtaka
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Paper Abstract

Accurate measurement with CD-SEMs requires the use of a calibrated standard. A new standard, micro-scale was developed using laser interferometer lithography and anisotropic chemical etching on Si-material and was reported previously. In this paper, we report on a method to control measurement accuracy of CD-SEMs using the micro-scale. We have studied various factors for measurement errors and have estimated the 95 percent confidence level. We have carried out 3-pitch measurement of the micro-scale in a fully automated mode and estimated the 95 percent confidence level. Then, we compared two 95 percent confidence levels and concluded that the estimation expected from the measurement errors was reasonable.

Paper Details

Date Published: 7 July 1997
PDF: 9 pages
Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275945
Show Author Affiliations
Katsuhiro Sasada, Hitachi, Ltd. (Japan)
Nobuyoshi Hashimoto, Hitachi, Ltd. (Japan)
Hiroyoshi Mori, Hitachi, Ltd. (Japan)
Tadashi Ohtaka, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 3050:
Metrology, Inspection, and Process Control for Microlithography XI
Susan K. Jones, Editor(s)

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