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Proceedings Paper

Basic challenges of optical overlay measurements
Author(s): Anatoly Shchemelinin; Eugene Shifrin; Alexander I. Zaslavsky
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Paper Abstract

The basic challenges of optical overlay measurements are discussed. It is shown that overlay measurement precision is determined by optical resolution, signal to noise ratio of the measurement system and properties of the overlay target. Some tips for better overlay target design ad hardware improvement are formulated. It is shown that an interferometer based measurement system allows better accuracy than the brightfield one. It is shown that for current measurement techniques, 130 nm design rule requirements can be met.

Paper Details

Date Published: 7 July 1997
PDF: 7 pages
Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275929
Show Author Affiliations
Anatoly Shchemelinin, KLA Instruments Corp. (Israel)
Eugene Shifrin, KLA Instruments Corp. (Israel)
Alexander I. Zaslavsky, KLA Instruments Corp. (Israel)


Published in SPIE Proceedings Vol. 3050:
Metrology, Inspection, and Process Control for Microlithography XI
Susan K. Jones, Editor(s)

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